| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymeric compound useful as a resin component to be used in a negative resist composition, from which a resist pattern with a good shape can be formed. <P>SOLUTION: The polymeric compound has a structural unit (f1) including a base dissociative group expressed by general formula (f1-1) or general formula (f1-2) and a structural unit (f2) including a crosslinking group-containing group. In the formulae, R represents a hydrogen atom, a 1-5C lower alkyl group or a 1-5C halogenated lower alkyl group; X represents a divalent organic group; A<SB POS="POST">aryl</SB>represents an aromatic cyclic group optionally having a substituent; X<SB POS="POST">01</SB>represents a single bond or a divalent connecting group; and R<SP POS="POST">2</SP>represents an organic group having a fluorine atom. <P>COPYRIGHT: (C)2013,JPO&INPIT |
