METHOD OF PRODUCING POLYMER FOR LITHOGRAPHY, METHOD OF PRODUCING RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE ON WHICH PATTERN IS FORMED

摘要

PROBLEM TO BE SOLVED: To provide a method of producing a polymer for lithography, which can efficiently reduce a residual monomer contained in the polymer.

SOLUTION: The method of producing the polymer for lithography includes: a step of radically polymerizing a monomer by using a polymerization initiator in the presence of a polymerization solvent to obtain a polymerization reaction solution having viscosity of >120 mPa s at 25°C; a step of diluting the polymerization reaction solution thus obtained, with a diluting solvent to obtain a post-dilution solution having viscosity of ≤120 mPa s at 25°C; and a step of dropping the post-dilution solution on a poor solvent for the polymer to precipitate the polymer in the post-dilution solution.

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