发明名称 SUBSTRATE IMPRINT APPARATUS
摘要 PURPOSE: An imprint device is provided to improve a pressing quality as the parallelization of pressing a stage is properly corrected by first and second pressing correction units. CONSTITUTION: An imprint device comprise a chamber unit(2), a stage(4), a pressing device unit(M), a pressing support unit(6), and first and second pressing correction units. A stamp(S) is placed inside the chamber unit. The stage is placed under the stamp, and a substrate(G) is placed on the stage. The pressing device unit and a pressing drive source(M1) are move the stage up and down so that the stamp is pressed to the substrate. The pressing support unit is placed on the stage. The support plate(P) of the pressing support unit supports the upper surface of the stamp when the stamp is pressed to the substrate. The first pressing correction unit holds the stage when the stage is pressed, and corrects the parallelization of pressing by positioning the underside of the support plate correspondently to the upper surface of the stamp. The second pressing correction unit elastically pushes the stage to the support plate with the corrected parallelization of pressing.
申请公布号 KR20130003439(A) 申请公布日期 2013.01.09
申请号 KR20110064806 申请日期 2011.06.30
申请人 DMS CO., LTD. 发明人 YANG, JAE YOUNG;KIM, JUNG KWON;KANG, JI EUN;KIM, JUN TAK;KIM, BYEONG GUK
分类号 B29C59/02;B29C33/38 主分类号 B29C59/02
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