| 摘要 |
PROBLEM TO BE SOLVED: To provide a material for forming a resist coating film, from which a coating film can be formed on a resist film without damaging lithographic characteristics, and to provide a method for forming a resist pattern using the material for forming a resist coating film.SOLUTION: The material for forming a resist coating film comprises at least a resin component (A) the alkali solubility of which is increased by action of an acid, dissolved in an organic solvent (S). The resin component (A) contains structural units (a) derived from an acrylic acid ester by 75 to 100 mol% (provided that a repeating unit expressed by general formula (1) is excluded). The organic solvent (S) contains at least one kind of organic solvent (S1) selected from the group consisting of an ether organic solvent having no hydroxyl group and an alcohol solvent. |
