发明名称
摘要 <p>A FLOTOX EEPROM of the invention includes: a plurality of floating gates 11 arranged in array, each having a tunnel window 12 and allowing electron injection and extraction via the tunnel window; a plurality of select gates 13 provided in one-on-one correspondence to the plural floating gates 11; a control gate 16 shared by the plural floating gates 11; a source 17 shared by the plural floating gates 11; and a drain 18 shared by the plural floating gates 11. Therefore, the FLOTOX EEPROM does not encounter the decrease of junction breakdown voltage of a drain region, allowing the application of sufficiently high write voltage. Further, cell area can be reduced.</p>
申请公布号 JP5112731(B2) 申请公布日期 2013.01.09
申请号 JP20070098301 申请日期 2007.04.04
申请人 发明人
分类号 H01L21/8247;G11C16/02;G11C16/04;H01L21/336;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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