发明名称 Method for producing a metal insert in a timepiece
摘要 <p>The method involves preliminary structuring of a silicon substrate such that the substrate preliminary possesses a form of a timepiece, where the substrate comprises monolithic silicon block. A blind cavity is formed in the structured silicon substrate, and is filled with a metal/metal alloy (7). A conductive bottom of the cavity is formed, where the bottom is formed by the silicon substrate and by a porous silicon layer. Walls of the cavity are covered by an insulating material layer.</p>
申请公布号 EP2543625(A1) 申请公布日期 2013.01.09
申请号 EP20120174856 申请日期 2012.07.03
申请人 CSEM CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE SA - RECHERCHE ET DEVELOPPEMENT 发明人 CARDOT, FRANCIS;JEANNERET, SYLVAIN
分类号 B81C99/00;G04B17/06 主分类号 B81C99/00
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