发明名称 |
Method for producing a metal insert in a timepiece |
摘要 |
<p>The method involves preliminary structuring of a silicon substrate such that the substrate preliminary possesses a form of a timepiece, where the substrate comprises monolithic silicon block. A blind cavity is formed in the structured silicon substrate, and is filled with a metal/metal alloy (7). A conductive bottom of the cavity is formed, where the bottom is formed by the silicon substrate and by a porous silicon layer. Walls of the cavity are covered by an insulating material layer.</p> |
申请公布号 |
EP2543625(A1) |
申请公布日期 |
2013.01.09 |
申请号 |
EP20120174856 |
申请日期 |
2012.07.03 |
申请人 |
CSEM CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE SA - RECHERCHE ET DEVELOPPEMENT |
发明人 |
CARDOT, FRANCIS;JEANNERET, SYLVAIN |
分类号 |
B81C99/00;G04B17/06 |
主分类号 |
B81C99/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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