| 摘要 |
A wide range continuous diluter for diluting gases that contain small particles to allow subsequent measurement of the diluted gases with an instrument is provided. A dilution gas inlet receives a dilution gas, and a sample gas inlet receives a sample gas. A flow meter measures the sample gas flow rate. A mixer receives and mixes the dilution gas and the sample gas at a dilution ratio. An instrument flow outlet provides a well-defined flow into the instrument from the mixture flow. A make-up gas inlet is arranged to provide make-up gas into the mixture flow at a controlled rate. Because the dilution gas flows at a controlled rate and the mixture flows at a controlled rate, changing the flow rate of the make-up gas causes a responsive change in the sample gas flow rate, thereby allowing continuous adjustment and control of the dilution ratio when desired. |
