| 摘要 |
<p>PURPOSE: An active ray-sensitive or radiation sensitive resin composition, an active ray-sensitive or radiation-sensitive film using the same, mask blanks, and a pattern formation method are provided to increase resolving potency. CONSTITUTION: An active ray-sensitive or a radiation sensitive resin composition contains a compound including one or more groups substituted with one or more phenolic -OH, and a radical represented by hydrogen atoms of the phenolic -OH. In the chemical formula 1, R11 and R12 independently exhibit the hydrogen atoms, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group, and n1 exhibits 0 or 1. If n1 is 0, X11 exhibits oxygen atoms or Sulfur-atoms. If the n1 is 1, X11 exhibits nitrogen atoms.</p> |
