发明名称 CLEANING SOLUTION COMPOSITION FOR OFFSET-PRINTING CLICHE AND CLEANING METHOD USING THE SAME
摘要 PURPOSE: A cleansing composition for an intaglio plate for offset printing is provided to obtain reproducibility of a printing pattern without damaging to an intaglio plate with micro patterns by not containing an anticorrosion agent and fluorine compounds. CONSTITUTION: A cleansing composition for an intaglio plate for offset printing comprises 1-25 weight% of an organic amine compound, 10-70 weight% of an aromatic alcohol, and 20-80 weight% of an organic solvent. The organic amine compound is represented by chemical formula 1. In chemical formula 1, each of R1-R3 is independently hydrogen, a substituted or unsubstituted C1-10 alkyl group, a substituted or unsubstituted C2-10 alkenyl group or hydroxyalkenyl group, a carboxyl group, a substituted or unsubstituted C5-8 cycloalkyl group or hydroxycycloalkyl group, a phenyl group, or a benzyl group.
申请公布号 KR20130002636(A) 申请公布日期 2013.01.08
申请号 KR20110063709 申请日期 2011.06.29
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 KIM, SUNG SIK;LEE, YU JIN;KIM, JEONG HYUN;KO, KYOUNG JUN
分类号 C11D7/32;C11D7/22 主分类号 C11D7/32
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