发明名称 |
Polishing pad manufacturing method |
摘要 |
A method for manufacturing a polishing pad prevents slurry leaks and provides a pad that can be used to provide high optical detection accuracy. The method for manufacturing a polishing pad includes forming a groove for injecting a light-transmitting region forming material on the back surface of a polishing layer; injecting the light-transmitting region forming material into the groove and curing the material to form a light-transmitting region; and buffing the front surface of the polishing layer to expose the light-transmitting region on the front surface.
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申请公布号 |
US8348724(B2) |
申请公布日期 |
2013.01.08 |
申请号 |
US20080600201 |
申请日期 |
2008.05.09 |
申请人 |
TOYO TIRE & RUBBER CO., LTD.;DOURA MASATO;HIROSE JUNJI;NAKAMURA KENJI;FUKUDA TAKESHI;SATO AKINORI |
发明人 |
DOURA MASATO;HIROSE JUNJI;NAKAMURA KENJI;FUKUDA TAKESHI;SATO AKINORI |
分类号 |
B24B1/00;B24B37/013;B24B37/20;H01L21/304 |
主分类号 |
B24B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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