发明名称 System and method of measuring irregularity of a glass substrate
摘要 A system and a method of measuring irregularity of a glass substrate using only a reflection light reflected by an upper surface of reflection lights reflected by the upper surface and a lower surface of the glass substrate are disclosed. The system includes a light source section configured to output a first light to the glass substrate and a screen. Here, the first light outputted from the light source section is reflected by an upper surface and a lower surface of the glass substrate, a first reflection light reflected by the upper surface of the glass substrate is inputted into the screen, a first line is formed on the screen in accordance with the input of the first reflection light, a second reflection light reflected by the lower surface of the glass substrate is inputted into the screen through the upper surface, a second line is formed on the screen in accordance with the input of the second reflection light, and the light source section and the screen are disposed on the basis of the glass substrate so that the lines are separated.
申请公布号 US8351051(B2) 申请公布日期 2013.01.08
申请号 US201113094711 申请日期 2011.04.26
申请人 SEMISYSCO CO., LTD.;LEE SOON-JONG;WOO BONG-JOO;PARK BYOUNG-CHAN;CHOI SEONG-JIN;CHUNG JAE-HOON 发明人 LEE SOON-JONG;WOO BONG-JOO;PARK BYOUNG-CHAN;CHOI SEONG-JIN;CHUNG JAE-HOON
分类号 G01B11/30;G01N21/00 主分类号 G01B11/30
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