发明名称 EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To improve the CE of an EUV light generation device. <P>SOLUTION: An extreme ultraviolet light generation device comprises: a laser beam generation system; a laser control system controlling at least any one of light intensity and output timing of at least one laser beam outputted from the laser light generation system; a chamber having at least one incident port for introducing at least one laser beam outputted from the laser beam generation system into the chamber; and a target supply unit provided in the chamber and supplying a target substance to a predetermined region in the chamber. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013004258(A) 申请公布日期 2013.01.07
申请号 JP20110133111 申请日期 2011.06.15
申请人 GIGAPHOTON INC 发明人 HORI TSUKASA;KAKIZAKI KOJI;YANAGIDA TATSUYA;WAKABAYASHI OSAMU
分类号 H05G2/00;G03F7/20;H01L21/027 主分类号 H05G2/00
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