发明名称 MANUFACTURING METHOD OF GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To enhance light extraction efficiency in a group III nitride semiconductor light-emitting element. <P>SOLUTION: A p-clad layer 15 composed of p-AlGaN is formed on a luminous layer 14 by MOCVD. The pressure is set at 30 kPa, and the Mg concentration is set at 1.5&times;10<SP POS="POST">20</SP>/cm<SP POS="POST">3</SP>. Consequently, a large number of regions of nitrogen polarity are generated in the crystal of group III element polarity, and the surface of the p-clad layer 15 has an uneven shape of hexagonal prism. Subsequently, a film-like p-contact layer 16 consisting of GaN is formed on the p-clad layer 15 along the uneven shape by MOCVD. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013004846(A) 申请公布日期 2013.01.07
申请号 JP20110136197 申请日期 2011.06.20
申请人 TOYODA GOSEI CO LTD 发明人 NAKADA NAOYUKI;USHIDA YASUHISA
分类号 H01L33/22;H01L21/205;H01L33/32 主分类号 H01L33/22
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