| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a production method of a patterned retardation film, by which a patterned retardation film excellent in pattern accuracy can be easily produced. <P>SOLUTION: The method for producing a patterned retardation film includes an exposure step and a coating step. In the exposure step, a film 3 for forming a long alignment film comprising a transparent film substrate 1 and an alignment layer-forming layer 2' containing a photo-aligning material formed on the transparent film substrate is subjected to a first exposure process and a second exposure process, in which the alignment layer-forming layer is irradiated with polarized UV rays while the film 3 is continuously conveyed, so as to form an alignment layer 2 including a first alignment area 2a where a rod-like compound having diffraction index anisotropy is arranged in a given direction and a second alignment area 2b where the rod-like compound is arranged in a direction different from the direction in the first alignment area. In the coating step, a coating liquid for forming a retardation layer containing the rod-like compound is applied on the alignment layer. The polarization direction of polarized UV rays differs between in the first exposure process and in the second exposure process. <P>COPYRIGHT: (C)2013,JPO&INPIT |
