| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a UV ray filter mechanism to be used for a UV ray irradiation device, the filter mechanism comprising a shutter member and a movable UV ray absorption filter, and to provide a UV ray irradiation device having the mechanism. <P>SOLUTION: The UV ray filter mechanism is applied to a UV ray irradiation device having a UV irradiation light source that faces a substrate to be treated. The mechanism includes a shutter member 13 having an aperture and at least one layer of a UV ray absorption filter member 14 having an aperture, both disposed between the substrate to be treated and the UV irradiation light source. The filter member is configured to be movable parallel to the shutter member. The UV ray irradiation device includes the above UV ray filter mechanism. <P>COPYRIGHT: (C)2013,JPO&INPIT |
