| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint technique capable of suppressing a decrease in throughput and yield even when a foreign matter exists on a substrate. <P>SOLUTION: An imprint method includes: an inspection step S21 of inspecting a substrate and acquiring information for the foreign matter on the substrate; a film formation step S23A of forming a film covering a foreign matter when the inspection step determines that the foreign matter exists; a coating step of coating the substrate with a resin; a contacting step S28 of bringing the resin coated on the substrate into contact with a pattern surface of a die; and a curing step of curing the resin to be brought into contact with the pattern surface. The film formation step is performed before the contacting step. <P>COPYRIGHT: (C)2013,JPO&INPIT |
