发明名称 INTEGRATED METROLOGY FOR WAFER SCREENING
摘要 Integrated wafer or substrate bow measurement modules are described. For example, a multi-chamber system includes a chamber housing a bow measurement module. In another example, a method of pre-screening a wafer includes inserting a wafer or a substrate into a multi-chamber system. A bow parameter of the wafer or the substrate is measured in a bow measurement module housed in a chamber of the multi-chamber system.
申请公布号 WO2012129051(A3) 申请公布日期 2013.01.03
申请号 WO2012US29246 申请日期 2012.03.15
申请人 APPLIED MATERIALS, INC.;HSU, WEI-YUNG;CHUNG, HUA;SHIU, TING-RUEI;CUI, JIE 发明人 HSU, WEI-YUNG;CHUNG, HUA;SHIU, TING-RUEI;CUI, JIE
分类号 H01L21/02;H01L21/66;H01L33/00 主分类号 H01L21/02
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