Microlithographic extreme UV (EUV) projection exposure apparatus for imaging reflective mask on photosensitive layer, has drive element that is adapted to reflective switching elements to emit projection and heating light rays

摘要

The EUV projection exposure apparatus (10) has a projection light source and a heating light source that respectively generate projection light ray and heating light ray. The catoptric projection lenses (26) are equipped with imaging mirrors, and an object plane and an image plane in which a mask (14) and photosensitive layer (16) are arranged. A drive element is adapted to reflective switching elements such that projection light rays and heating light rays are emitted from the projection lenses corresponding to two different positions of switching elements. An independent claim is included for a method for operating microlithographic extreme UV projection exposure apparatus.