发明名称 |
TITANIUM-DOPED INDIUM OXIDE FILMS |
摘要 |
An apparatus and methods of forming the apparatus include a film of transparent conductive titanium-doped indium oxide for use in a variety of configurations and systems. The film of transparent conductive titanium-doped indium oxide may be structured as one or more monolayers. The film of transparent conductive titanium-doped indium oxide may be formed using atomic layer deposition.
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申请公布号 |
US2013000544(A1) |
申请公布日期 |
2013.01.03 |
申请号 |
US201213615906 |
申请日期 |
2012.09.14 |
申请人 |
MICRON TECHNOLOGY, INC.;AHN KIE Y.;FORBES LEONARD |
发明人 |
AHN KIE Y.;FORBES LEONARD |
分类号 |
H01L21/322 |
主分类号 |
H01L21/322 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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