发明名称 TITANIUM-DOPED INDIUM OXIDE FILMS
摘要 An apparatus and methods of forming the apparatus include a film of transparent conductive titanium-doped indium oxide for use in a variety of configurations and systems. The film of transparent conductive titanium-doped indium oxide may be structured as one or more monolayers. The film of transparent conductive titanium-doped indium oxide may be formed using atomic layer deposition.
申请公布号 US2013000544(A1) 申请公布日期 2013.01.03
申请号 US201213615906 申请日期 2012.09.14
申请人 MICRON TECHNOLOGY, INC.;AHN KIE Y.;FORBES LEONARD 发明人 AHN KIE Y.;FORBES LEONARD
分类号 H01L21/322 主分类号 H01L21/322
代理机构 代理人
主权项
地址