| 发明名称 |
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION |
| 摘要 |
An actinic-ray- or radiation-sensitive resin composition according to the present invention includes (A) a resin to be decomposed to increase its solubility in an alkali developer when acted on by an acid, and (B) a compound represented by the general formula (1-1) below.
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| 申请公布号 |
US2013004741(A1) |
申请公布日期 |
2013.01.03 |
| 申请号 |
US201213538246 |
申请日期 |
2012.06.29 |
| 申请人 |
FUJIFILM CORPORATION;MATSUDA TOMOKI;TOKUGAWA YOKO;SHIBUYA AKINORI |
发明人 |
MATSUDA TOMOKI;TOKUGAWA YOKO;SHIBUYA AKINORI |
| 分类号 |
G03F7/027;B32B33/00;G03F7/20 |
主分类号 |
G03F7/027 |
| 代理机构 |
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代理人 |
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