发明名称 Chemical Bath Deposition Apparatus for Fabrication of Semiconductor Films
摘要 A chemical bath deposition method and a system are presented to prepare different thin films on plane substrates. In particular, they are useful to deposit CdS or ZnS buffer layers in manufacture of thin film solar cells. This method and the deposition system deposit thin films onto vertically travelling plane workpieces delivered by a conveyor belt. The thin films are deposited with continuously spraying the reaction solutions from their freshly mixed styles to gradually aged forms until the designed thickness is obtained. The substrates and the solutions are heated to a reaction temperature. During the deposition processes, the front surfaces of the substrates are totally covered with the sprayed solutions but the substrate backsides are remained dry. The reaction ambience inside the reactor can be isolated from the outside atmosphere. The apparatus is designed to generate a minimum amount of waste solutions for chemical treatments.
申请公布号 US2013005073(A1) 申请公布日期 2013.01.03
申请号 US201113172826 申请日期 2011.06.30
申请人 WANG JIAXIONG 发明人 WANG JIAXIONG
分类号 H01L31/0296;B05B1/02;B05C11/00;H01L31/0272;H01L31/0304;H01L31/0312;H01L31/032 主分类号 H01L31/0296
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