There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.
申请公布号
WO2012135286(A3)
申请公布日期
2013.01.03
申请号
WO2012US30850
申请日期
2012.03.28
申请人
THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK;BRAINARD, ROBERT L.;CARDINEAU, BRIAN
