PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR CONTROLLING THE SAME

摘要

There is disclosed a plasma enhanced chemical vapor deposition apparatus including a pallet to load and convey an object thereon to provide a functional film to the object by plasma reaction, wherein the pallet includes a base, a jig to fix the object, and a fixing part disposed on the base at an upper side of the fixing part to fix the object to the pallet.