发明名称 |
PEDESTAL WITH EDGE GAS DEFLECTOR FOR EDGE PROFILE CONTROL |
摘要 |
A substrate processing system includes a pedestal including a substrate supporting surface having a diameter that is greater than a diameter of a substrate to be processed by the substrate processing system. A first surface extends a first distance above the substrate supporting surface in a direction substantially perpendicular to the substrate supporting surface. The first distance is greater than or equal to one-half of a thickness of the substrate. A gap is defined between the first surface and an outer diameter of the substrate. A second surface extends a second distance from the first surface at an angle with respect to the first surface. The angle is greater than zero and less than ninety degrees. A third surface extends from the second surface and is substantially parallel to the substrate supporting surface. An etchant source directs etchant onto the substrate to etch the substrate.
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申请公布号 |
US2013000848(A1) |
申请公布日期 |
2013.01.03 |
申请号 |
US201213462096 |
申请日期 |
2012.05.02 |
申请人 |
NOVELLUS SYSTEMS INC.;WONGSENAKHUM PANYA;LIND GARY;KOTHNUR PRASHANTH |
发明人 |
WONGSENAKHUM PANYA;LIND GARY;KOTHNUR PRASHANTH |
分类号 |
B05B1/18;B05C11/00 |
主分类号 |
B05B1/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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