发明名称 |
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION |
摘要 |
An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can form independent line patterns with high resolution and excellent shapes and shows excellent resist performances including roughness characteristics, and to provide an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1) (the respective symbols in the formula represent the same definitions as in the claims and the specification).
|
申请公布号 |
US2013004888(A1) |
申请公布日期 |
2013.01.03 |
申请号 |
US201213528477 |
申请日期 |
2012.06.20 |
申请人 |
FUJIFILM CORPORATION;INASAKI TAKESHI;TSUCHIMURA TOMOTAKA |
发明人 |
INASAKI TAKESHI;TSUCHIMURA TOMOTAKA |
分类号 |
C08F212/08;G03F1/00;G03F1/50;G03F1/76;G03F1/78;G03F7/20 |
主分类号 |
C08F212/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|