| 发明名称 |
RHEOLOGICAL FLUIDS FOR PARTICLE REMOVAL |
| 摘要 |
Methods and apparatus for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing electrorheological (ER) and magnetorheological (MR) fluids to remove contaminant residual particles from the substrate surface are provided.
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| 申请公布号 |
US2013000669(A1) |
申请公布日期 |
2013.01.03 |
| 申请号 |
US201213616282 |
申请日期 |
2012.09.14 |
| 申请人 |
MICRON TECHNOLOGY, INC.;SINHA NISHANT |
发明人 |
SINHA NISHANT |
| 分类号 |
B08B7/00;B03C1/02;B03C5/00 |
主分类号 |
B08B7/00 |
| 代理机构 |
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代理人 |
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