发明名称 SEMICONDUCTOR MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME
摘要 A semiconductor memory device includes a substrate and a plurality of rows of memory cells. The substrate comprises a plurality of isolation structures and a plurality of active regions. Each of the active regions is spaced apart from another active region by one of the isolation structures. In a cross-section of the substrate between two rows of memory cells in a direction parallel to the two rows of memory cells, a maximum height of each isolation structure with respect to a bottom of the substrate is lower than or equal to minimum heights of active regions adjacent thereto.
申请公布号 US2013001669(A1) 申请公布日期 2013.01.03
申请号 US201113172449 申请日期 2011.06.29
申请人 MACRONIX INTERNATIONAL CO., LTD.;LIN LO-YUEH 发明人 LIN LO-YUEH
分类号 H01L29/788;H01L21/336 主分类号 H01L29/788
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