| 摘要 |
<p>Device for filling a crucible with polycrystalline silicon, comprises: a tube (1) for receiving the polycrystalline silicon, comprising a tube wall, a lower end, and an upper end; a shutter (2) for closing the lower end of the tube; and aperture (3) in the tube wall. The shortest axial distance between lower end of the tube and aperture is not less than the height (h) of the shutter, and not > 1.5x height of the shutter. The shortest axial distance between the upper end of the tube and the aperture is not less than 0.5x D, where D is the outer diameter of the tube. The cross-sectional length of the aperture is 2-5 mm. Device for filling a crucible with polycrystalline silicon, comprises: a tube (1) for receiving the polycrystalline silicon, comprising a tube wall, a lower end, and an upper end; a shutter (2) for closing the lower end of the tube; and aperture (3) in the tube wall. The shortest axial distance between the lower end of the tube and aperture is not less than the height (h) of the shutter, and not > 1.5x height of the shutter. The shortest axial distance between the upper end of the tube and the aperture is not less than 0.5x D, where D is the outer diameter of the tube. The aperture in the tube wall is inclined in ascending manner from the inner wall of the tube to the outer wall of the tube with an inclination angle of alpha . The cross-sectional length of the aperture is 2-5 mm. An independent claim is also included for filling the crucible with polycrystalline silicon, comprising (i) loading the device with polycrystalline silicon, (ii) evacuating the device for removing oxygen gas from interstices between the polycrystalline silicon, (iii) passing a heat exchange gas in the evacuated device for filling the interstices with the replacing gas, and (iv) opening the aperture of the device for filling the crucible with polycrystalline silicon.</p> |
