发明名称 |
POLYAMIC ACID, POLYAMIC ACID SOLUTION, POLYIMIDE PROTECTIVE LAYER, AND POLYIMIDE FILM |
摘要 |
The present invention relates to a polyamic acid and a display device, and more specifically to a display device including a polyamic acid and an imidized film thereof which can be used as a base layer or protective layer of the display device. Furthermore, the display device includes a polyamic acid and an imidized film formed therefrom which can be applied as the base layer or protective layer of the display device due to excellent thermal properties by a low thermal expansion rate and a high pyrolysis temperature. |
申请公布号 |
WO2013002614(A2) |
申请公布日期 |
2013.01.03 |
申请号 |
WO2012KR05230 |
申请日期 |
2012.07.02 |
申请人 |
KOLON INDUSTRIES, INC.;PARK, SANG YOON;JUNG, HAK GEE |
发明人 |
PARK, SANG YOON;JUNG, HAK GEE |
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