发明名称 POLYAMIC ACID, POLYAMIC ACID SOLUTION, POLYIMIDE PROTECTIVE LAYER, AND POLYIMIDE FILM
摘要 The present invention relates to a polyamic acid and a display device, and more specifically to a display device including a polyamic acid and an imidized film thereof which can be used as a base layer or protective layer of the display device. Furthermore, the display device includes a polyamic acid and an imidized film formed therefrom which can be applied as the base layer or protective layer of the display device due to excellent thermal properties by a low thermal expansion rate and a high pyrolysis temperature.
申请公布号 WO2013002614(A2) 申请公布日期 2013.01.03
申请号 WO2012KR05230 申请日期 2012.07.02
申请人 KOLON INDUSTRIES, INC.;PARK, SANG YOON;JUNG, HAK GEE 发明人 PARK, SANG YOON;JUNG, HAK GEE
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