发明名称 AlGaN/GaN HYBRID MOS-HFET
摘要 A field effect transistor (FET) includes source and drain electrodes, a channel layer, a barrier layer over the channel layer, a passivation layer covering the barrier layer for passivating the barrier layer, a gate electrode extending through the barrier layer and the passivation layer, and a gate dielectric surrounding a portion of the gate electrode that extends through the barrier layer and the passivation layer, wherein the passivation layer is a first material and the gate dielectric is a second material, and the first material is different than the second material.
申请公布号 WO2013002900(A1) 申请公布日期 2013.01.03
申请号 WO2012US37833 申请日期 2012.05.14
申请人 HRL LABORATORIES, LLC;CORRION, ANDREA;BOUTROS, KARIM S.;CHEN, MARY Y.;KIM, SAMUEL J.;CHU, RONGMING;BURNHAM, SHAWN D. 发明人 CORRION, ANDREA;BOUTROS, KARIM S.;CHEN, MARY Y.;KIM, SAMUEL J.;CHU, RONGMING;BURNHAM, SHAWN D.
分类号 H01L29/78;H01L21/336;H01L29/778 主分类号 H01L29/78
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