CLEANING TOOL FOR POLYSILICON REACTOR

摘要

Systems and methods are provided for cleaning an interior surface of a chemical vapor deposition reactor bell used in the production of polysilicon. In one method, the reactor bell is positioned atop a frame; a first actuator is operated such that the brush engages the interior surface of the reactor bell. A flow of liquid is directed from a nozzle against the interior surface of the reactor bell, and a second actuator is operated to rotate the brush.