METHOD OF POLISHING A WORKPIECE WITH AN ABRASIVE SEGMENT COMPRISING ABRASIVE AGGREGATES HAVING SILICON CARBIDE PARTICLES

摘要

A method of polishing a workpiece can include placing a workpiece on a support structure. In an embodiment, the method can also include contacting the workpiece with an abrasive segment. The abrasive segment can include a plurality of abrasive aggregates that include silicon carbide particles bound together in a binder material. Additionally, the method can include moving the abrasive segment and the workpiece relative to each other.