Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatus,申请号EP20100001311-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatus
摘要
申请公布号	EP2354853(B1)	申请公布日期	2013.01.02
申请号	EP20100001311	申请日期	2010.02.09
申请人	CARL ZEISS SMT GMBH	发明人	PATRA, MICHAEL
分类号	G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Methods and apparatus for cooling gas turbine engine components

Mixed code, and method and apparatus for generating the same

Fibre channel over Ethernet

Method for performing motion estimation in video encoding, a video encoding system and a video encoding device

Apparatus and method for installing monitor driver

System and method for optimizing mainframe applications

Method for controlling the distribution of software code updates

Information terminal device having secret function

Underquilt with multiple layered wool fill

Method of laser processing a gallium nitride substrate

Sealing fastener

Assembly for refrigerant circuits

Novel class of superlattice materials and superlattice precursors, and method for their manufacture and use

Methods for fabricating one or more metal damascene structures in a semiconductor wafer

Reduced antifog level in oxygen scavenging film with antifog properties

Fluid fillable multi-compartment bladder for flow and flood control

Method and system for performing a printing process, method and apparatus for processing information, print server and method of performing a printing process in print server, and program

Chess to the second power

Control apparatus for internal combustion engine

Synthetic jet fuel and diesel fuel compositions and processes