| 摘要 |
In a semiconductor device, a through hole via extending through the substrate of the device may be formed on the basis of a carbon-containing material, thereby providing excellent compatibility with high temperature processes, while also providing superior electrical performance compared to doped semiconductor materials and the like. Thus, in some illustrative embodiments, the through hole vias may be formed prior to any process steps used for forming critical circuit elements, thereby substantially avoiding any interference of the through hole via structure with a device level of the corresponding semiconductor device. Consequently, highly efficient three-dimensional integration schemes may be realized. |
