发明名称 Memory element, method of manufacturing the same, and memory device
摘要 <p>A memory element includes: a first electrode, a memory layer, and a second electrode in this order. The memory layer includes a resistance change layer provided on the first electrode side, and an ion source layer containing one or more of metallic elements, and the ion source layer being provided on the second electrode side. The ion source layer includes a first ion source layer and a second ion source layer, the first ion source layer containing one or more of chalcogen elements of tellurium (Te), sulfur (S), and selenium (Se) and being provided on the resistance change layer side, and the second ion source layer containing the chalcogen element with a content different from a content in the first ion source layer and being provided on the second electrode side.</p>
申请公布号 EP2541555(A2) 申请公布日期 2013.01.02
申请号 EP20120004603 申请日期 2012.06.19
申请人 SONY CORPORATION 发明人 SHIMUTA, MASAYUKI;YASUDA, SHUICHIRO;MIZUGUCHI, TETSUYA;OHBA, KAZUHIRO;ARATANI, KATSUHISA
分类号 G11C13/00 主分类号 G11C13/00
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