<p>PURPOSE: A nanopattern formation method is provided to facilitate process of various forms and/or large diameter substrates. CONSTITUTION: A nanopattern formation method comprises the following steps: forming a mask layer which includes nanoagglomerates particles on a substrate(105); and forming nanopatterns(120) on the substrate by selectively etching the surface of the substrate from the opening. The nanoagglomerates are thermodynamically stable agglomerates and are voluntarily generated on the substrate. A separate thermal process is not accompanied to form nanoagglomerates.</p>