发明名称 METHOD OF FORMING NANO PATTERN
摘要 <p>PURPOSE: A nanopattern formation method is provided to facilitate process of various forms and/or large diameter substrates. CONSTITUTION: A nanopattern formation method comprises the following steps: forming a mask layer which includes nanoagglomerates particles on a substrate(105); and forming nanopatterns(120) on the substrate by selectively etching the surface of the substrate from the opening. The nanoagglomerates are thermodynamically stable agglomerates and are voluntarily generated on the substrate. A separate thermal process is not accompanied to form nanoagglomerates.</p>
申请公布号 KR101217783(B1) 申请公布日期 2013.01.02
申请号 KR20120081787 申请日期 2012.07.26
申请人 KOREA INSTITUTE OF MACHINERY & MATERIALS 发明人 KIM, DONG HO;KWON, JUNG DAE;RHA, JONG JOO
分类号 G03F7/26;G03F1/68 主分类号 G03F7/26
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