发明名称 |
Methods and systems for inspecting structures for crystallographic imperfections |
摘要 |
<p>Embodiments of methods and systems for inspecting a structure for a crystallographic imperfection are provided. In the method, an X-ray wavelength that is particularly susceptible to diffraction by the crystallographic imperfection is identified. Then an X-ray source is provided to emit X-rays in the identified X-ray wavelength. While placing the structure at a sequence of positions relative to the X-ray source, X-rays are directed at the structure in multiple, non-parallel arrays to create sequential patterns of diffracted X-rays. The patterns of diffracted X-rays are digitally captured and communicated to a computer that compares them to locate the crystallographic imperfection. For a surface imperfection, the imperfection may be marked with a target to allow for physical removal.</p> |
申请公布号 |
EP2541237(A2) |
申请公布日期 |
2013.01.02 |
申请号 |
EP20120172657 |
申请日期 |
2012.06.19 |
申请人 |
HONEYWELL INTERNATIONAL INC. |
发明人 |
SINGH SURENDRA;SZUROMI, ANDY;TOLPYGO VLADIMIR K.;KINNEY, ANDY |
分类号 |
G01N23/207 |
主分类号 |
G01N23/207 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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