发明名称 Polymer composition and photoresist comprising same
摘要 <p>A polymer comprises the polymerized product of monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, and a photoacid-generating monomer; a chain transfer agent of the formula; wherein Z is a y valent C 1-20 organic group, x is 0 or 1, R d is a substituted or unsubstituted C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, or C 7-20 aralkyl; and optionally, an initiator.</p>
申请公布号 EP2540750(A1) 申请公布日期 2013.01.02
申请号 EP20120173331 申请日期 2012.06.25
申请人 DOW GLOBAL TECHNOLOGIES LLC 发明人 KRAMER, JOHN W.
分类号 C08F220/28;G03F7/004;G03F7/039 主分类号 C08F220/28
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