发明名称 Interferometry-based stress analysis
摘要 <p>A method comprises illuminating a sample (14) with a coherent source (11), generating a first interference image of the sample, inducing a phase shift in the coherent source, generating a second interference image of the sample, inducing a load on the sample, generating a third interference image of the sample, and generating a phase distribution based on the interference images. The first interference image represents surface stress in the sample (14), the second interference image includes carrier fringes based on the phase shift, the third interference image represents a change in the surface stress due to the load, and the phase distribution represents the change in the surface stress.</p>
申请公布号 EP2541192(A1) 申请公布日期 2013.01.02
申请号 EP20120170765 申请日期 2012.06.04
申请人 UNITED TECHNOLOGIES CORPORATION 发明人 BELOUSOV, IGOR V.;BARABASH, YURIY M.;KONONENKO, YURIY G.;NIKOLENKO, ANDRII S.
分类号 G01B9/02;G01B11/16;G03H1/00 主分类号 G01B9/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利