发明名称 Gate valve and substrate processing system using same
摘要 <p>A gate valve includes a plurality of openings through which objects to be processed are loaded and unloaded; a valve body to be pressed toward the openings; a pressed portion provided to the valve body; a main slider slidable in parallel with a surface where the openings are formed; and a cam provided to the main slider and having a protrusion and an inclined portion inclined from the protrusion in a sloped shape, for pressing the pressed portion of the valve body in a state where the valve body faces the openings. The valve body has one or more slit-shaped openings serving as opening portions for opening the openings, and portions adjacent to the slit-shaped openings serving as blocking portions for blocking the openings.</p>
申请公布号 EP2541591(A2) 申请公布日期 2013.01.02
申请号 EP20120173542 申请日期 2012.06.26
申请人 TOKYO ELECTRON LIMITED 发明人 TATESHITA, KOICHI
分类号 H01L21/67 主分类号 H01L21/67
代理机构 代理人
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