发明名称 |
X-RAY IRRADIATION DEVICE AND ANALYSIS DEVICE |
摘要 |
<p>[Object] The present invention provides an X-ray irradiation device capable of adjusting the energy of X-rays in a wide range, and an analysis device equipped with the X-ray irradiation device. [Solving Means] An X-ray irradiation device according to an embodiment of the present invention focuses X-rays emitted from an X-ray generation mechanism to a predetermined focal position by a focusing mechanism. The X-ray generation mechanism has a structure which generates a plurality of X-rays having different wavelengths. The focusing mechanism has a structure in which the plurality of X-rays are focused to the same focal position by focusing elements having diffraction characteristics suitable for the wavelengths of the respective X-rays generated by the X-ray generation mechanism.</p> |
申请公布号 |
EP2542035(A1) |
申请公布日期 |
2013.01.02 |
申请号 |
EP20110762263 |
申请日期 |
2011.03.30 |
申请人 |
NATIONAL INSTITUTE FOR MATERIALS SCIENCE;ULVAC-PHI, INC. |
发明人 |
YAMAZUI, HIROMICHI;KOBAYASHI, KEISUKE;IWAI, HIDEO;KOBATA, MASAAKI |
分类号 |
H05G2/00;G01N23/227;H05G1/70 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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