| 摘要 |
<p>The invention relates to a process for producing a photonic crystal which consists of a material of high refractive index, comprising the following process steps: a) providing a polymer structure with crosslinked air pores, whose surface has empty interstitial sites, b) applying a homogeneous, isotropic thin coating material to the surface of the polymer structure, c) introducing a high-index material, d) opening up a route to the polymer or to the coating material applied in step b), e) removing the layer applied in step b), f) removing the polymeric structure.</p> |
