| 发明名称 |
Deposition of gallium containing thin films using new gallium precursors. |
| 摘要 |
<p>Compounds of formula (I): [(R a )(R b )Ga(OR c )] x , wherein:
- Ra and Rb are independently selected in the group consisting of H, C1-C6 linear or branched alkyl, aryl or alkylsilyl;
- Rc is selected in the group consisting of C1-C4 linear or branched alkyl, aryl or alkylsilyl;
- x is an integer equal to 1 or 2.</p> |
| 申请公布号 |
EP2540732(A1) |
申请公布日期 |
2013.01.02 |
| 申请号 |
EP20110305844 |
申请日期 |
2011.06.30 |
| 申请人 |
L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE |
发明人 |
LACHAUD, CHRISTOPHE;ZAUNER, ANDREAS;LEPLAT, AURELIEN;LAHOOTUN, VANINA |
| 分类号 |
C07F5/00;C23C16/00 |
主分类号 |
C07F5/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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