发明名称 |
Film removing device and film removing method |
摘要 |
A film removing device includes an approach stage having a flat approach part having a surface substantially flush with the surface of a substrate supported on a support member. The flat approach part faces a first side surface of the substrate at a corner of the substrate where the first side surface and a second side surface of the substrate join. A film removing nozzle spouts a solvent toward a peripheral part of the substrate and sucks a solution while being moved along the second side surface and the approach stage. A gas is spouted into a gap between the flat approach part and the corner of the substrate so that the gas flows through the gap toward the second side surface.
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申请公布号 |
US8343284(B2) |
申请公布日期 |
2013.01.01 |
申请号 |
US201113163276 |
申请日期 |
2011.06.17 |
申请人 |
TOKYO ELECTRON LIMITED;KAMEI SHIGENORI;OOISHI KOTARO;HAMADA MASAHITO |
发明人 |
KAMEI SHIGENORI;OOISHI KOTARO;HAMADA MASAHITO |
分类号 |
B08B5/04 |
主分类号 |
B08B5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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