发明名称 |
Controllable radiation lithographic apparatus and method |
摘要 |
A lithographic arrangement allows for controlling radiation characteristics. An illumination system provides a beam of radiation from radiation provided by a radiation source. The radiation source includes an array of individually controllable elements, each individually controllable element being capable of emitting radiation. A support structure supports a patterning device. The patterning device imparts the radiation beam with a pattern. A projection system projects the patterned radiation beam onto a target portion of a substrate held by a substrate table. A radiation peak intensity detection apparatus detects a peak in the intensity of an emission spectrum of one or more of the individually controllable elements of the radiation source.
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申请公布号 |
US8345225(B2) |
申请公布日期 |
2013.01.01 |
申请号 |
US20090539973 |
申请日期 |
2009.08.12 |
申请人 |
ASML NETHERLANDS B.V.;ONVLEE JOHANNES;DIERICHS MARCEL MATHIJS THEODORE MARIE |
发明人 |
ONVLEE JOHANNES;DIERICHS MARCEL MATHIJS THEODORE MARIE |
分类号 |
G03B27/74;G03B27/32;G03B27/42;G03B27/44;G03B27/52;G03B27/54 |
主分类号 |
G03B27/74 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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