发明名称 |
Overlay metrology target |
摘要 |
In one embodiment, a metrology target for determining a relative shift between two or more successive layers of a substrate may comprise; an first structure on a first layer of a substrate and an second structure on a successive layer to the first layer of the substrate arranged to determine relative shifts in alignment in both the x and y directions of the substrate by analyzing the first structure and second structure overlay.
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申请公布号 |
US8345243(B2) |
申请公布日期 |
2013.01.01 |
申请号 |
US20100717430 |
申请日期 |
2010.03.04 |
申请人 |
KLA-TENCOR CORPORATION;GHINOVKER MARK;LEVINSKI VLADIMIR |
发明人 |
GHINOVKER MARK;LEVINSKI VLADIMIR |
分类号 |
G01B11/00;G06K9/00;H01L21/76;H01L23/544 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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