发明名称 |
Method for vaporizing non-gaseous precursor in a fluidized bed |
摘要 |
Methods and systems for depositing a film on a substrate are disclosed. In one embodiment, a method includes converting a non-gaseous precursor into vapor phase. Converting the precursor includes: forming a fluidized bed by flowing gas at a sufficiently high flow rate to suspend and stir a plurality of solid particles, and converting the phase of the non-gaseous precursor into vapor phase in the fluidized bed. The method also includes transferring the precursor in vapor phase through a passage; and performing deposition on one or more substrates with the transferred precursor in vapor phase.
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申请公布号 |
US8343583(B2) |
申请公布日期 |
2013.01.01 |
申请号 |
US20090498885 |
申请日期 |
2009.07.07 |
申请人 |
ASM INTERNATIONAL N.V.;JAN SNIJDERS GERT;RAAIJMAKERS IVO |
发明人 |
JAN SNIJDERS GERT;RAAIJMAKERS IVO |
分类号 |
C23C16/442 |
主分类号 |
C23C16/442 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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