发明名称 Interface structure for copper-copper peeling integrity
摘要 An integrated circuit device is disclosed. An exemplary integrated circuit device includes a first copper layer, a second copper layer, and an interface between the first and second copper layers. The interface includes a flat zone interface region and an intergrowth interface region, wherein the flat zone interface region is less than or equal to 50% of the interface.
申请公布号 US8344506(B2) 申请公布日期 2013.01.01
申请号 US20090633499 申请日期 2009.12.08
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.;LIN CHENG-CHUNG;LIU CHUNG-SHI;YU CHEN-HUA 发明人 LIN CHENG-CHUNG;LIU CHUNG-SHI;YU CHEN-HUA
分类号 H01L23/50 主分类号 H01L23/50
代理机构 代理人
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