| 摘要 |
PURPOSE: A batch type processing apparatus is provided to ensure high efficiency of processing gas and apply an ALD(Atomic Layer Deposition) method even to a large-area object. CONSTITUTION: A batch type processing apparatus comprises a main chamber(31a), a plurality of stages(101a-101y), and a plurality of covers(102a-102y). The plurality of stages are stacked in the vertical direction inside the main chamber and loaded with objects(G) to be processed. The plurality of covers are provided in the respective stages and cover the objects placed on object placing parts(105). The plurality of stages and the plurality of covers form a plurality of small processing spaces(106) smaller than the main chamber to surround the respective objects. [Reference numerals] (5) Exhaust device
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