发明名称 POROUS TEMPLATE AND IMPRINTING STACK FOR NANO-IMPRINT LITHOGRAPHY
摘要 <p>POROUS TEMPLATE AND IMPRINTING STACK FOR NANO-IMPRINT LITHOGRAPHYAbstractAn imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.Figure: 4</p>
申请公布号 SG185929(A1) 申请公布日期 2012.12.28
申请号 SG20120079778 申请日期 2008.11.21
申请人 MOLECULAR IMPRINTS, INC. 发明人 XU, FRANK, Y.;LIU, WEIJUN;FLETCHER, EDWARD, B.;SREENIVASAN, SIDLGATA, V.;CHOI, BYUNG-JIN;KHUSNATDINOV, NIYAZ;CHERALA, ANSHUMAN;SELINIDIS, KOSTA
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